Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors

As the scaling proceeds, the transverse electric field increase, and a mobility attenuation phenomenon becomes of primordial interest. Indeed, the high transverse electric field is generally ascribed [1] to surface roughness scattering in the channel and consequently reduce effective mobility of car...

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Main Authors: A. El Abbassi, Y. Amhouche, E. Bendada, R. Rmaily, K. Raïs
Format: Article
Language:English
Published: Wiley 2001-01-01
Series:Active and Passive Electronic Components
Subjects:
Online Access:http://dx.doi.org/10.1155/2001/75780
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author A. El Abbassi
Y. Amhouche
E. Bendada
R. Rmaily
K. Raïs
author_facet A. El Abbassi
Y. Amhouche
E. Bendada
R. Rmaily
K. Raïs
author_sort A. El Abbassi
collection DOAJ
description As the scaling proceeds, the transverse electric field increase, and a mobility attenuation phenomenon becomes of primordial interest. Indeed, the high transverse electric field is generally ascribed [1] to surface roughness scattering in the channel and consequently reduce effective mobility of carriers. In short channel MOSFET, the Source-Drain resistance Rsd influence strongly the effective mobility.
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institution Kabale University
issn 0882-7516
1563-5031
language English
publishDate 2001-01-01
publisher Wiley
record_format Article
series Active and Passive Electronic Components
spelling doaj-art-fbb60449910d40e0945d1b19b9c6f4a52025-02-03T01:07:27ZengWileyActive and Passive Electronic Components0882-75161563-50312001-01-01241132210.1155/2001/75780Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS TransistorsA. El Abbassi0Y. Amhouche1E. Bendada2R. Rmaily3K. Raïs4Laboratoire de Caractérisation des Composants à Semi-conducteurs, Université Chouaib, Doukkali B.P. 20, EL Jadida, MoroccoLaboratoire de Caractérisation des Composants à Semi-conducteurs, Université Chouaib, Doukkali B.P. 20, EL Jadida, MoroccoLaboratoire de la Microélectronique et de l'instrumentation, Faculté des Sciences et Techniques, B.P. 509 Errachidia, MoroccoLaboratoire de Caractérisation des Composants à Semi-conducteurs, Université Chouaib, Doukkali B.P. 20, EL Jadida, MoroccoLaboratoire de Caractérisation des Composants à Semi-conducteurs, Université Chouaib, Doukkali B.P. 20, EL Jadida, MoroccoAs the scaling proceeds, the transverse electric field increase, and a mobility attenuation phenomenon becomes of primordial interest. Indeed, the high transverse electric field is generally ascribed [1] to surface roughness scattering in the channel and consequently reduce effective mobility of carriers. In short channel MOSFET, the Source-Drain resistance Rsd influence strongly the effective mobility.http://dx.doi.org/10.1155/2001/75780MOS TransistorSurface roughnessEffective mobilitySeries resistance.
spellingShingle A. El Abbassi
Y. Amhouche
E. Bendada
R. Rmaily
K. Raïs
Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
Active and Passive Electronic Components
MOS Transistor
Surface roughness
Effective mobility
Series resistance.
title Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
title_full Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
title_fullStr Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
title_full_unstemmed Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
title_short Characterization of Series Resistances and Mobility Attenuation Phenomena in Short Channel MOS Transistors
title_sort characterization of series resistances and mobility attenuation phenomena in short channel mos transistors
topic MOS Transistor
Surface roughness
Effective mobility
Series resistance.
url http://dx.doi.org/10.1155/2001/75780
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