Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy

Although heavily phosphorus-doped diamond (PDD) holds great potential for advanced device applications, incorporating phosphorus into diamond remains challenging with conventional growth methods. In this study, optical emission spectroscopy (OES) was used to correlate the emission intensity ratio of...

Full description

Saved in:
Bibliographic Details
Main Authors: Kil-dong Sung, Stefan Andrei Irimiciuc, Michal Novotný, Zdeněk Weiss, Pavel Hubík, Jaromír Kopeček, Martin Vondráček, Vincent Mortet
Format: Article
Language:English
Published: AIP Publishing LLC 2025-01-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/5.0238713
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832542763325849600
author Kil-dong Sung
Stefan Andrei Irimiciuc
Michal Novotný
Zdeněk Weiss
Pavel Hubík
Jaromír Kopeček
Martin Vondráček
Vincent Mortet
author_facet Kil-dong Sung
Stefan Andrei Irimiciuc
Michal Novotný
Zdeněk Weiss
Pavel Hubík
Jaromír Kopeček
Martin Vondráček
Vincent Mortet
author_sort Kil-dong Sung
collection DOAJ
description Although heavily phosphorus-doped diamond (PDD) holds great potential for advanced device applications, incorporating phosphorus into diamond remains challenging with conventional growth methods. In this study, optical emission spectroscopy (OES) was used to correlate the emission intensity ratio of PH to CH radicals (IPH/ICH) with phosphorus concentration ([P]) in diamond layers synthesized under varying phosphine ([PH3]/[H2]) and methane ([CH4]/[H2]) concentrations using microwave plasma-enhanced chemical vapor deposition. OES results revealed a strong proportional relationship between IPH/ICH and [P] across different [PH3]/[CH4] ratios. However, beyond a maximum [P] of ∼7.0 × 1020 atoms/cm3, further increases in IPH/ICH did not lead to higher [P] with a significant reduction in phosphorus incorporation efficiency (η), consistent with the solubility limits of phosphorus in diamond. At lower [PH3]/[H2], [P] did not scale proportionally with [PH3]/[CH4], exhibiting nonlinear behavior due to phosphorus contamination (Pcont.) in the reaction chamber, which provided sufficient PHx radicals to grow heavily PDD without PH3 gas flow. By understanding plasma properties and their effects on [P], heavily PDD has been effectively achieved with enhancing [P] (up to 745%) and η (up to 143%) by alternating the dominant radical species in the plasma. Time-dependent control of precursor gas flow allowed modulation of IPH/ICH, improving control over phosphorus incorporation. This novel growth approach offers valuable insights for optimizing PDD synthesis, enabling more efficient phosphorus incorporation for electronic, electrochemical, and quantum applications.
format Article
id doaj-art-fa91a3df6f3f437ca6b1b31808d26ccb
institution Kabale University
issn 2166-532X
language English
publishDate 2025-01-01
publisher AIP Publishing LLC
record_format Article
series APL Materials
spelling doaj-art-fa91a3df6f3f437ca6b1b31808d26ccb2025-02-03T16:42:31ZengAIP Publishing LLCAPL Materials2166-532X2025-01-01131011118011118-1310.1063/5.0238713Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopyKil-dong Sung0Stefan Andrei Irimiciuc1Michal Novotný2Zdeněk Weiss3Pavel Hubík4Jaromír Kopeček5Martin Vondráček6Vincent Mortet7FZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicFZU - Institute of Physics of the Czech Academy of Sciences, Na Slovance 1999/2, 18200 Prague 8, Czech RepublicAlthough heavily phosphorus-doped diamond (PDD) holds great potential for advanced device applications, incorporating phosphorus into diamond remains challenging with conventional growth methods. In this study, optical emission spectroscopy (OES) was used to correlate the emission intensity ratio of PH to CH radicals (IPH/ICH) with phosphorus concentration ([P]) in diamond layers synthesized under varying phosphine ([PH3]/[H2]) and methane ([CH4]/[H2]) concentrations using microwave plasma-enhanced chemical vapor deposition. OES results revealed a strong proportional relationship between IPH/ICH and [P] across different [PH3]/[CH4] ratios. However, beyond a maximum [P] of ∼7.0 × 1020 atoms/cm3, further increases in IPH/ICH did not lead to higher [P] with a significant reduction in phosphorus incorporation efficiency (η), consistent with the solubility limits of phosphorus in diamond. At lower [PH3]/[H2], [P] did not scale proportionally with [PH3]/[CH4], exhibiting nonlinear behavior due to phosphorus contamination (Pcont.) in the reaction chamber, which provided sufficient PHx radicals to grow heavily PDD without PH3 gas flow. By understanding plasma properties and their effects on [P], heavily PDD has been effectively achieved with enhancing [P] (up to 745%) and η (up to 143%) by alternating the dominant radical species in the plasma. Time-dependent control of precursor gas flow allowed modulation of IPH/ICH, improving control over phosphorus incorporation. This novel growth approach offers valuable insights for optimizing PDD synthesis, enabling more efficient phosphorus incorporation for electronic, electrochemical, and quantum applications.http://dx.doi.org/10.1063/5.0238713
spellingShingle Kil-dong Sung
Stefan Andrei Irimiciuc
Michal Novotný
Zdeněk Weiss
Pavel Hubík
Jaromír Kopeček
Martin Vondráček
Vincent Mortet
Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
APL Materials
title Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
title_full Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
title_fullStr Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
title_full_unstemmed Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
title_short Advanced perspective on heavily phosphorus-doped diamond layers via optical emission spectroscopy
title_sort advanced perspective on heavily phosphorus doped diamond layers via optical emission spectroscopy
url http://dx.doi.org/10.1063/5.0238713
work_keys_str_mv AT kildongsung advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT stefanandreiirimiciuc advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT michalnovotny advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT zdenekweiss advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT pavelhubik advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT jaromirkopecek advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT martinvondracek advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy
AT vincentmortet advancedperspectiveonheavilyphosphorusdopeddiamondlayersviaopticalemissionspectroscopy