Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting
Step-and-repeat UV nanoimprinting for large-scale nanostructure fabrication under atmospheric pressure was realized using high-viscosity photocurable resin and a simple nanoimprinting system. In step-and-repeat UV nanoimprinting under atmospheric pressure using low-viscosity resin, large-scale nanos...
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| Format: | Article |
| Language: | English |
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Wiley
2012-01-01
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| Series: | Journal of Nanotechnology |
| Online Access: | http://dx.doi.org/10.1155/2012/103439 |
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| author | Kentaro Ishibashi Hiroshi Goto Jun Mizuno Shuichi Shoji |
| author_facet | Kentaro Ishibashi Hiroshi Goto Jun Mizuno Shuichi Shoji |
| author_sort | Kentaro Ishibashi |
| collection | DOAJ |
| description | Step-and-repeat UV nanoimprinting for large-scale nanostructure fabrication under atmospheric pressure was realized using high-viscosity photocurable resin and a simple nanoimprinting system. In step-and-repeat UV nanoimprinting under atmospheric pressure using low-viscosity resin, large-scale nanostructure fabrication is very difficult, due to bubble defects and nonuniformity of the residual layer. To minimize bubble defects and nonuniformity of the residual layer, we focused on the damping effects of photocurable resin viscosity. Fabrication of 165 dies was successfully demonstrated in a 130×130 mm2 area on an 8 in silicon substrate by step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin. Nanostructures with widths and spacing patterns from 80 nm to 3 μm and 200 nm depth were formed using a quartz mold. Bubble defects were not observed, and residual layer uniformity was within 30 nm ±10%. This study reports on simple step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin, as a very widely available method for large-scale mass production of nanostructures. |
| format | Article |
| id | doaj-art-e5dde8a89b13416098d751da2a4a1ac3 |
| institution | Kabale University |
| issn | 1687-9503 1687-9511 |
| language | English |
| publishDate | 2012-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Journal of Nanotechnology |
| spelling | doaj-art-e5dde8a89b13416098d751da2a4a1ac32025-02-03T01:03:12ZengWileyJournal of Nanotechnology1687-95031687-95112012-01-01201210.1155/2012/103439103439Large-Scale Atmospheric Step-and-Repeat UV NanoimprintingKentaro Ishibashi0Hiroshi Goto1Jun Mizuno2Shuichi Shoji3Department of Nanoscience and Nanoengineering, Waseda University, 3-4-1, Okubo, Shinjuku, Tokyo 169-8555, JapanNano Processing System Division, Toshiba-Machine Co., Ltd., 2068-3 Ooka, Numazu, Shizuoka 410-8510, JapanInstitute for Nanoscience and Nanotechnology, Waseda University, 513 Waseda Tsurumaki-cho, Shinjuku, Tokyo 162-0041, JapanDepartment of Nanoscience and Nanoengineering, Waseda University, 3-4-1, Okubo, Shinjuku, Tokyo 169-8555, JapanStep-and-repeat UV nanoimprinting for large-scale nanostructure fabrication under atmospheric pressure was realized using high-viscosity photocurable resin and a simple nanoimprinting system. In step-and-repeat UV nanoimprinting under atmospheric pressure using low-viscosity resin, large-scale nanostructure fabrication is very difficult, due to bubble defects and nonuniformity of the residual layer. To minimize bubble defects and nonuniformity of the residual layer, we focused on the damping effects of photocurable resin viscosity. Fabrication of 165 dies was successfully demonstrated in a 130×130 mm2 area on an 8 in silicon substrate by step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin. Nanostructures with widths and spacing patterns from 80 nm to 3 μm and 200 nm depth were formed using a quartz mold. Bubble defects were not observed, and residual layer uniformity was within 30 nm ±10%. This study reports on simple step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin, as a very widely available method for large-scale mass production of nanostructures.http://dx.doi.org/10.1155/2012/103439 |
| spellingShingle | Kentaro Ishibashi Hiroshi Goto Jun Mizuno Shuichi Shoji Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting Journal of Nanotechnology |
| title | Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting |
| title_full | Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting |
| title_fullStr | Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting |
| title_full_unstemmed | Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting |
| title_short | Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting |
| title_sort | large scale atmospheric step and repeat uv nanoimprinting |
| url | http://dx.doi.org/10.1155/2012/103439 |
| work_keys_str_mv | AT kentaroishibashi largescaleatmosphericstepandrepeatuvnanoimprinting AT hiroshigoto largescaleatmosphericstepandrepeatuvnanoimprinting AT junmizuno largescaleatmosphericstepandrepeatuvnanoimprinting AT shuichishoji largescaleatmosphericstepandrepeatuvnanoimprinting |