Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films
Poly(methyl methacrylate-block-styrene) block copolymers (BCs) of low dispersity were selectively sulfonated on the styrenic segment. Several combinations of degree of polymerization and volume fraction of each block were investigated to access different self-assembled morphologies. Thin films of th...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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Wiley
2019-01-01
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| Series: | Advances in Polymer Technology |
| Online Access: | http://dx.doi.org/10.1155/2019/4375838 |
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| author | Claudia Piñón-Balderrama César Leyva-Porras Roberto Olayo-Valles Javier Revilla-Vázquez Ulrich S. Schubert Carlos Guerrero-Sanchez José Bonilla-Cruz |
| author_facet | Claudia Piñón-Balderrama César Leyva-Porras Roberto Olayo-Valles Javier Revilla-Vázquez Ulrich S. Schubert Carlos Guerrero-Sanchez José Bonilla-Cruz |
| author_sort | Claudia Piñón-Balderrama |
| collection | DOAJ |
| description | Poly(methyl methacrylate-block-styrene) block copolymers (BCs) of low dispersity were selectively sulfonated on the styrenic segment. Several combinations of degree of polymerization and volume fraction of each block were investigated to access different self-assembled morphologies. Thin films of the sulfonated block copolymers were prepared by spin-coating and exposed to solvent vapor (SVA) or thermal annealing (TA) to reach equilibrium morphologies. Atomic force microscopy (AFM) was employed for characterizing the films, which exhibited a variety of nanometric equilibrium and nonequilibrium morphologies. Highly sulfonated samples revealed the formation of a honeycomb-like morphology obtained in solution rather than by the self-assembly of the BC in the solid state. The described morphologies may be employed in applications such as templates for nanomanufacturing and as cover and binder of catalytic particles in fuel cells. |
| format | Article |
| id | doaj-art-e597e2b19b2e43d983ef8751e0ccd4c8 |
| institution | Kabale University |
| issn | 0730-6679 1098-2329 |
| language | English |
| publishDate | 2019-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Polymer Technology |
| spelling | doaj-art-e597e2b19b2e43d983ef8751e0ccd4c82025-02-03T06:00:09ZengWileyAdvances in Polymer Technology0730-66791098-23292019-01-01201910.1155/2019/43758384375838Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin FilmsClaudia Piñón-Balderrama0César Leyva-Porras1Roberto Olayo-Valles2Javier Revilla-Vázquez3Ulrich S. Schubert4Carlos Guerrero-Sanchez5José Bonilla-Cruz6Advanced Functional Materials & Nanotechnology Group, Polymer Science and Nanotechnology Lab, Centro de Investigación en Materiales Avanzados S.C. (CIMAV-Unidad Monterrey), Av. Alianza Norte # 202, PIIT, Autopista Monterrey-Aeropuerto Km 10, C.P. 66628, Apodaca, NL, MexicoCentro de Investigación en Materiales Avanzados S. C. (CIMAV), Miguel de Cervantes # 120, Complejo Industrial Chihuahua, C.P. 31136, Chihuahua, Chih, MexicoDepartamento de Física, Universidad Autónoma Metropolitana-Iztapalapa, Av. San Rafael Atlixco 186, C.P. 09340, Mexico City, MexicoDepartamento de Ingeniería y Tecnología, División Ciencias Químicas, Facultad de Estudios Superiores Cuautitlán-UNAM, Av. Primero de Mayo s/n Cuautitlán Izcalli, C.P. 54740, Estado de México, MexicoLaboratory of Organic and Macromolecular Chemistry (IOMC), Friedrich Schiller University Jena, Humboldtstr. 10, 07743 Jena, GermanyLaboratory of Organic and Macromolecular Chemistry (IOMC), Friedrich Schiller University Jena, Humboldtstr. 10, 07743 Jena, GermanyAdvanced Functional Materials & Nanotechnology Group, Polymer Science and Nanotechnology Lab, Centro de Investigación en Materiales Avanzados S.C. (CIMAV-Unidad Monterrey), Av. Alianza Norte # 202, PIIT, Autopista Monterrey-Aeropuerto Km 10, C.P. 66628, Apodaca, NL, MexicoPoly(methyl methacrylate-block-styrene) block copolymers (BCs) of low dispersity were selectively sulfonated on the styrenic segment. Several combinations of degree of polymerization and volume fraction of each block were investigated to access different self-assembled morphologies. Thin films of the sulfonated block copolymers were prepared by spin-coating and exposed to solvent vapor (SVA) or thermal annealing (TA) to reach equilibrium morphologies. Atomic force microscopy (AFM) was employed for characterizing the films, which exhibited a variety of nanometric equilibrium and nonequilibrium morphologies. Highly sulfonated samples revealed the formation of a honeycomb-like morphology obtained in solution rather than by the self-assembly of the BC in the solid state. The described morphologies may be employed in applications such as templates for nanomanufacturing and as cover and binder of catalytic particles in fuel cells.http://dx.doi.org/10.1155/2019/4375838 |
| spellingShingle | Claudia Piñón-Balderrama César Leyva-Porras Roberto Olayo-Valles Javier Revilla-Vázquez Ulrich S. Schubert Carlos Guerrero-Sanchez José Bonilla-Cruz Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films Advances in Polymer Technology |
| title | Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films |
| title_full | Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films |
| title_fullStr | Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films |
| title_full_unstemmed | Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films |
| title_short | Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films |
| title_sort | self assembly investigations of sulfonated poly methyl methacrylate block styrene diblock copolymer thin films |
| url | http://dx.doi.org/10.1155/2019/4375838 |
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