Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography
Highlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall em...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2025-04-01
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| Series: | Nano-Micro Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1007/s40820-025-01737-w |
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