Low Resistivity and High Carrier Concentration in SnO<sub>2</sub> Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments
The tin dioxide (SnO<sub>2</sub>) thin films in this work were prepared by using plasma-enhanced atomic layer deposition (PEALD), and a systematic analysis was conducted to evaluate the influence of post-deposition annealing at various temperatures in a nitrogen–hydrogen mixed atmosphere...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/15/13/986 |
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