Field enhancement effect in reactive ion etching – a novel mechanism for plasma processing and plasma diagnostics
Field enhancement effect (FEE) is a physical phenomenon widely investigated in the context of field emitters and nanophotonic devices, where electromagnetic fields can be enhanced significantly at geometrically sharp boundaries. Here, we propose and report the FEE in the plasma sheath when geometric...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-06-01
|
| Series: | Materials & Design |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S0264127525005647 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!