Field enhancement effect in reactive ion etching – a novel mechanism for plasma processing and plasma diagnostics
Field enhancement effect (FEE) is a physical phenomenon widely investigated in the context of field emitters and nanophotonic devices, where electromagnetic fields can be enhanced significantly at geometrically sharp boundaries. Here, we propose and report the FEE in the plasma sheath when geometric...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-06-01
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| Series: | Materials & Design |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S0264127525005647 |
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