APA (7th ed.) Citation

Chang, B., Anand, G. A., Liu, X., Jansen, H., Romano, L., & Han, A. Field enhancement effect in reactive ion etching – a novel mechanism for plasma processing and plasma diagnostics. Elsevier.

Chicago Style (17th ed.) Citation

Chang, Bingdong, Gwendoline A.E Anand, Xiyuan Liu, Henri Jansen, Lucia Romano, and Anpan Han. Field Enhancement Effect in Reactive Ion Etching – a Novel Mechanism for Plasma Processing and Plasma Diagnostics. Elsevier.

MLA (9th ed.) Citation

Chang, Bingdong, et al. Field Enhancement Effect in Reactive Ion Etching – a Novel Mechanism for Plasma Processing and Plasma Diagnostics. Elsevier.