Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth

This study establishes a multi-field coupling model that includes a thermal field, flow field, oxygen and carbon impurity concentration field, and magnetic field, focusing on controlling the transport of oxygen impurities at the free surface of the melt. The effects of cusp magnetic field introducti...

Full description

Saved in:
Bibliographic Details
Main Authors: Wenyong Zhang, Dedong Gao, Shan Wang, Yan An, Haohao Wu, Haixin Lin, Lin Hou
Format: Article
Language:English
Published: AIP Publishing LLC 2025-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0239067
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832542747852013568
author Wenyong Zhang
Dedong Gao
Shan Wang
Yan An
Haohao Wu
Haixin Lin
Lin Hou
author_facet Wenyong Zhang
Dedong Gao
Shan Wang
Yan An
Haohao Wu
Haixin Lin
Lin Hou
author_sort Wenyong Zhang
collection DOAJ
description This study establishes a multi-field coupling model that includes a thermal field, flow field, oxygen and carbon impurity concentration field, and magnetic field, focusing on controlling the transport of oxygen impurities at the free surface of the melt. The effects of cusp magnetic field introduction, argon inlet flow velocity, and furnace pressure on the transport of oxygen and carbon impurities are analyzed, and the concentration field distribution of oxygen and carbon impurities within the furnace at the equal-diameter stage (300 mm) under different parameters is obtained. The results show that the method combining the cusp magnetic field with adjustments in furnace pressure and argon flow velocity can significantly reduce the oxygen concentration in the melt below the crystal and effectively expel oxygen and carbon impurities, providing optimization references for applying cusp magnetic fields and reducing oxygen and carbon impurities in the melt for large-sized Czochralski single-crystal silicon.
format Article
id doaj-art-c5b4ea2819c047789363f1ceff164db7
institution Kabale University
issn 2158-3226
language English
publishDate 2025-01-01
publisher AIP Publishing LLC
record_format Article
series AIP Advances
spelling doaj-art-c5b4ea2819c047789363f1ceff164db72025-02-03T16:40:42ZengAIP Publishing LLCAIP Advances2158-32262025-01-01151015103015103-1810.1063/5.0239067Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growthWenyong Zhang0Dedong Gao1Shan Wang2Yan An3Haohao Wu4Haixin Lin5Lin Hou6School of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaSchool of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaSchool of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaSichuan Gokin Solar Technology Co., Ltd, Yibin 644000, Sichuan, ChinaSchool of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaSchool of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaSchool of Mechanical Engineering, Qinghai University, Xining 810016, Qinghai, ChinaThis study establishes a multi-field coupling model that includes a thermal field, flow field, oxygen and carbon impurity concentration field, and magnetic field, focusing on controlling the transport of oxygen impurities at the free surface of the melt. The effects of cusp magnetic field introduction, argon inlet flow velocity, and furnace pressure on the transport of oxygen and carbon impurities are analyzed, and the concentration field distribution of oxygen and carbon impurities within the furnace at the equal-diameter stage (300 mm) under different parameters is obtained. The results show that the method combining the cusp magnetic field with adjustments in furnace pressure and argon flow velocity can significantly reduce the oxygen concentration in the melt below the crystal and effectively expel oxygen and carbon impurities, providing optimization references for applying cusp magnetic fields and reducing oxygen and carbon impurities in the melt for large-sized Czochralski single-crystal silicon.http://dx.doi.org/10.1063/5.0239067
spellingShingle Wenyong Zhang
Dedong Gao
Shan Wang
Yan An
Haohao Wu
Haixin Lin
Lin Hou
Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
AIP Advances
title Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
title_full Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
title_fullStr Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
title_full_unstemmed Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
title_short Simulation of oxygen and carbon impurity transport during magnetically controlled Czochralski silicon growth
title_sort simulation of oxygen and carbon impurity transport during magnetically controlled czochralski silicon growth
url http://dx.doi.org/10.1063/5.0239067
work_keys_str_mv AT wenyongzhang simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT dedonggao simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT shanwang simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT yanan simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT haohaowu simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT haixinlin simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth
AT linhou simulationofoxygenandcarbonimpuritytransportduringmagneticallycontrolledczochralskisilicongrowth