Omniphobic Photoresist‐Assisted Patterning of Porous Polymethacrylate Films

Omniphobic Photoresist‐Assisted Patterning of Porous Polymethacrylate Films

Abstract Patterning of various surface properties, including roughness, wettability, adhesiveness, and mechanical properties, can markedly enhance the functionality of test systems. Thus, porous polymethacrylates prepared by polymerization‐induced phase separation (PIPS) represent a promising class...

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Bibliographic Details
Main Authors: Dmitrii D. Kartsev, Ilia M. Lukianov, Eduard G. Sharapenkov, Artur Yu. Prilepskii, Pavel A. Levkin
Format: Article
Language:English
Published: Wiley-VCH 2025-01-01
Series:Advanced Materials Interfaces
Subjects:
cell patterning
omniphobic surfaces
photolithography
polymerization induced phase separation
porous polymethacrylate
wettability patterns
Online Access:https://doi.org/10.1002/admi.202400569
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https://doi.org/10.1002/admi.202400569

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