Fabrication of Ultra‐Thick Masks for X‐Ray Phase Contrast Imaging at Higher Energy

Fabrication of Ultra‐Thick Masks for X‐Ray Phase Contrast Imaging at Higher Energy

Abstract X‐ray phase contrast imaging (XPCI) provides higher sensitivity to contrast between low absorbing objects that can be invisible to conventional attenuation‐based X‐ray imaging. XPCI's main application is so far focused on medical areas at relatively low energies (< 100 keV). The tra...

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Bibliographic Details
Main Authors: Alessandro Rossi, Ian Buchanan, Alberto Astolfo, Martyna Michalska, Daniel Briglin, Anton Charman, Daniel Josell, Alessandro Olivo, Ioannis Papakonstantinou
Format: Article
Language:English
Published: Wiley-VCH 2025-04-01
Series:Advanced Materials Interfaces
Subjects:
non‐destructive testing
phase sensitivity
stepped parameters etching
superconformal Au deposition
X‐ray phase contrast imaging
Online Access:https://doi.org/10.1002/admi.202400749
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https://doi.org/10.1002/admi.202400749

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