A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles

A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles

Abstract Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health. The self‐limiting surface chemistry of ALD allows not only the coating of ultrathin and conformal...

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Bibliographic Details
Main Authors: Guanghui Yan, Gaoshan Huang, Jianjun Shi, Yi Ouyang, Xueqin Zuo, Zhihao Bao, Yongfeng Mei
Format: Article
Language:English
Published: Wiley-VCH 2025-07-01
Series:Advanced Materials Interfaces
Subjects:
atmospheric pressure
atomic layer deposition
functional nanoparticle
spatial atomic layer deposition
surface modification
Online Access:https://doi.org/10.1002/admi.202500140
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https://doi.org/10.1002/admi.202500140

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