Metrology of metasurfaces: optical properties

Abstract Optical Metasurfaces (MSs), a new class of planar optical elements, are profoundly disrupting the field of optical design, notably due to their compactness, multi-functionalities, and device integrability. Relying on planar nanofabrication processes closely akin to the semiconductor industr...

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Main Authors: Nicolas Kossowski, Yanel Tahmi, Amir Loucif, Martin Lepers, Benoit Wattellier, Guillaume Vienne, Samira Khadir, Patrice Genevet
Format: Article
Language:English
Published: Nature Portfolio 2025-01-01
Series:npj Nanophotonics
Online Access:https://doi.org/10.1038/s44310-024-00051-4
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_version_ 1832571596898828288
author Nicolas Kossowski
Yanel Tahmi
Amir Loucif
Martin Lepers
Benoit Wattellier
Guillaume Vienne
Samira Khadir
Patrice Genevet
author_facet Nicolas Kossowski
Yanel Tahmi
Amir Loucif
Martin Lepers
Benoit Wattellier
Guillaume Vienne
Samira Khadir
Patrice Genevet
author_sort Nicolas Kossowski
collection DOAJ
description Abstract Optical Metasurfaces (MSs), a new class of planar optical elements, are profoundly disrupting the field of optical design, notably due to their compactness, multi-functionalities, and device integrability. Relying on planar nanofabrication processes closely akin to the semiconductor industry, metasurface technology could benefit from cost-effective and potentially large-scale fabrication techniques forthwith. However, manufacturing metasurfaces with higher levels of complexity in foundries, and assembling them in production lines, still requires comprehensive optical metrology solutions, associated with established standardized measurements, that can validate their functionalities during and after integration into a system. Here, we first review the existing optical metrology techniques previously used for metasurface inspection, including intensity, polarization, quantitative phase measurements, and ptychographic imaging. We finally discuss new perspectives and exciting trends in metasurface designs, trying to identify the disruptive roles they could play in endowing next-generation metrology systems with improved performance and enhanced measurement functionalities.
format Article
id doaj-art-8a0ceb92d80c4ce290a124edf514dd8f
institution Kabale University
issn 2948-216X
language English
publishDate 2025-01-01
publisher Nature Portfolio
record_format Article
series npj Nanophotonics
spelling doaj-art-8a0ceb92d80c4ce290a124edf514dd8f2025-02-02T12:27:59ZengNature Portfolionpj Nanophotonics2948-216X2025-01-012111610.1038/s44310-024-00051-4Metrology of metasurfaces: optical propertiesNicolas Kossowski0Yanel Tahmi1Amir Loucif2Martin Lepers3Benoit Wattellier4Guillaume Vienne5Samira Khadir6Patrice Genevet7Université Côte d’Azur, CNRS, CRHEAUniversité Côte d’Azur, CNRS, CRHEAUniversité Côte d’Azur, CNRS, CRHEAUniversité Côte d’Azur, CNRS, CRHEAPhasicsUnity Semiconductor (Merck affiliate)Université Côte d’Azur, CNRS, CRHEAUniversité Côte d’Azur, CNRS, CRHEAAbstract Optical Metasurfaces (MSs), a new class of planar optical elements, are profoundly disrupting the field of optical design, notably due to their compactness, multi-functionalities, and device integrability. Relying on planar nanofabrication processes closely akin to the semiconductor industry, metasurface technology could benefit from cost-effective and potentially large-scale fabrication techniques forthwith. However, manufacturing metasurfaces with higher levels of complexity in foundries, and assembling them in production lines, still requires comprehensive optical metrology solutions, associated with established standardized measurements, that can validate their functionalities during and after integration into a system. Here, we first review the existing optical metrology techniques previously used for metasurface inspection, including intensity, polarization, quantitative phase measurements, and ptychographic imaging. We finally discuss new perspectives and exciting trends in metasurface designs, trying to identify the disruptive roles they could play in endowing next-generation metrology systems with improved performance and enhanced measurement functionalities.https://doi.org/10.1038/s44310-024-00051-4
spellingShingle Nicolas Kossowski
Yanel Tahmi
Amir Loucif
Martin Lepers
Benoit Wattellier
Guillaume Vienne
Samira Khadir
Patrice Genevet
Metrology of metasurfaces: optical properties
npj Nanophotonics
title Metrology of metasurfaces: optical properties
title_full Metrology of metasurfaces: optical properties
title_fullStr Metrology of metasurfaces: optical properties
title_full_unstemmed Metrology of metasurfaces: optical properties
title_short Metrology of metasurfaces: optical properties
title_sort metrology of metasurfaces optical properties
url https://doi.org/10.1038/s44310-024-00051-4
work_keys_str_mv AT nicolaskossowski metrologyofmetasurfacesopticalproperties
AT yaneltahmi metrologyofmetasurfacesopticalproperties
AT amirloucif metrologyofmetasurfacesopticalproperties
AT martinlepers metrologyofmetasurfacesopticalproperties
AT benoitwattellier metrologyofmetasurfacesopticalproperties
AT guillaumevienne metrologyofmetasurfacesopticalproperties
AT samirakhadir metrologyofmetasurfacesopticalproperties
AT patricegenevet metrologyofmetasurfacesopticalproperties