Thin film sputter-deposition of AlN crystals in oxygenated chamber: a pilot study

Thin film sputter-deposition of AlN crystals in oxygenated chamber: a pilot study

Aluminium nitride (AIN) is a promising thin film electrical insulation material layer in electronic devices. The magnetron sputtering method is usually employed to sputter-deposit AlN thin film on silicon (Si) substrate using a pure aluminium (Al) metallic target in a low base pressure vacuum condit...

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Bibliographic Details
Main Authors: Muhammad Izzuddin Abd Samad, Syazwani Izrah Badrudin, Marwan Mansor, Nafarizal Nayan, Ahmad Shuhaimi Abu Bakar, Mohd Zamri Yusop, Rhonira Latif
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:Materials Research Express
Subjects:
crystal growth
crystal structure
electrical properties
microstructure
thin films
Online Access:https://doi.org/10.1088/2053-1591/ad9b70
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https://doi.org/10.1088/2053-1591/ad9b70

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