Nanostructural, Chemical, and Mechanical Features of nc-Si:H Films Prepared by PECVD
This study examined the effects of film thickness on the nanostructural, chemical, and mechanical features of nc-Si:H films deposited by plasma-enhanced chemical vapor deposition. SiH4 and H2 were used as the source gases, and the deposition time was varied from 10 to 360 min. The mean nanocrystalli...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2012-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/643895 |
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