Effect of Process Pressure on the Properties of Cu<sub>2</sub>O Thin Films Deposited by RF Magnetron Sputtering

Effect of Process Pressure on the Properties of Cu<sub>2</sub>O Thin Films Deposited by RF Magnetron Sputtering

Cu<sub>2</sub>O thin films were deposited on soda-lime glass substrates using RF magnetron sputtering under various process pressures, and their structural, morphological, compositional, and optical properties were investigated. X-ray diffraction (XRD) revealed that the films crystallize...

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Bibliographic Details
Main Authors: Junghwan Park, Chang-Sik Son, Young-Guk Son, Donghyun Hwang
Format: Article
Language:English
Published: MDPI AG 2024-12-01
Series:Crystals
Subjects:
Cu<sub>2</sub>O thin film
radio frequency magnetron sputtering
process pressure
structural property
compositional property
optical property
Online Access:https://www.mdpi.com/2073-4352/15/1/2
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