Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching

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Bibliographic Details
Main Author: T. Kallfass
Format: Article
Language:English
Published: Wiley 1979-01-01
Series:Active and Passive Electronic Components
Online Access:http://dx.doi.org/10.1155/APEC.5.215
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author T. Kallfass
author_facet T. Kallfass
author_sort T. Kallfass
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institution Kabale University
issn 0882-7516
1563-5031
language English
publishDate 1979-01-01
publisher Wiley
record_format Article
series Active and Passive Electronic Components
spelling doaj-art-6ac7eea93392453284e4fa3e3f036c3e2025-02-03T05:57:37ZengWileyActive and Passive Electronic Components0882-75161563-50311979-01-015421521810.1155/APEC.5.215Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-EtchingT. Kallfasshttp://dx.doi.org/10.1155/APEC.5.215
spellingShingle T. Kallfass
Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
Active and Passive Electronic Components
title Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
title_full Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
title_fullStr Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
title_full_unstemmed Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
title_short Improvement of Adhesion, Line Definition, Contact Resistance and Semiconductor Properties by Sputter-Etching
title_sort improvement of adhesion line definition contact resistance and semiconductor properties by sputter etching
url http://dx.doi.org/10.1155/APEC.5.215
work_keys_str_mv AT tkallfass improvementofadhesionlinedefinitioncontactresistanceandsemiconductorpropertiesbysputteretching