X-Ray Reflectivity Study of Reactive DC Sputter Deposited Al2O3 Thin Films
X-ray reflection was performed on Al2O3 thin films obtained by dc magnetron sputtering of aluminium in an argon/oxygen atmosphere. Two kind of films (amorphous and γ-Al2O3) were deposited on polished silicon wafers by conventional sputtering and sputtering with ion bombardment on the growing film. T...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
1993-01-01
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| Series: | Active and Passive Electronic Components |
| Online Access: | http://dx.doi.org/10.1155/1993/36383 |
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