Evaluation and Characterization of High-Uniformity SiN<sub>x</sub> Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments
Silicon nitride (SiN<sub>x</sub>) thin film is a promising coating with great physiochemical and optical properties. However, the preparation of films with good comprehensive properties still faces challenges. This study focused on developing a method for the preparation of uniform SiN&l...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-02-01
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| Series: | Molecules |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1420-3049/30/5/1091 |
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