Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements

Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements

In semiconductor manufacturing, the accumulation of byproducts in exhaust pipelines under inadequate temperature control poses significant safety and operational risks. This study introduces an innovative approach employing an electrical capacitance measurement sensor system combined with an artific...

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Bibliographic Details
Main Authors: Minho Jeon, Anil Kumar Khambampati, Jong Hyun Song, Keun Joong Yoon, Kyung Youn Kim
Format: Article
Language:English
Published: IEEE 2025-01-01
Series:IEEE Access
Subjects:
Electrical capacitance measurement
semiconductor process
pipe deposition monitoring
free volume index
artificial neural network (ANN)
Online Access:https://ieeexplore.ieee.org/document/10817552/
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