Insights into the role of electrolytes in slurry performance for photoelectrochemical mechanical polishing of GaN wafers
Gallium Nitride (GaN) is the representative material among third-generation semiconductors. Due to its strong chemical stability, the chemical mechanical polishing (CMP) efficiency of GaN is extremely low. Photoelectrochemical mechanical polishing (PECMP) has proven effective for efficient, high-qua...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-05-01
|
| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S223878542500777X |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|