Optimization Design Method of a 6-DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens
The six-degree-of-freedom (6-DOF) micromotion mechanism is a key component in extreme ultraviolet (EUV) projection lithography objectives to compensate for wavefront aberration and ensure performance stability. It is required to have high precision and high reliability. A 6-DOF mirror micromotion me...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2024-01-01
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| Series: | Shock and Vibration |
| Online Access: | http://dx.doi.org/10.1155/2024/6168723 |
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