Direct Lithography for Regulating Multiple Properties of Organic Semiconductors via Photo‐Crosslinkers
Abstract Photo‐crosslinkers, as materials with negative photoresist characteristics, are applied in the direct lithography process of organic semiconductor devices. Compared to commonly used organic lithography processes, the direct lithography process only requires three steps: spin‐coating, exposu...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-08-01
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| Series: | Macromolecular Materials and Engineering |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/mame.202500062 |
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