Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes

When developing a technology based on single-photon avalanche diodes (SPADs), the SPAD characterization is mandatory to debug, optimize and monitor the microfabrication process. This is especially true for the development of SPAD arrays 3D integrated with CMOS readout electronics, where SPAD testing...

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Main Authors: Samuel Parent, Frederic Vachon, Valerie Gauthier, Steve Lamoureux, Alexandre Paquette, Jacob Deschamps, Tommy Rossignol, Nicolas Roy, Philippe Arsenault, Henri Dautet, Serge A. Charlebois, Jean-Francois Pratte
Format: Article
Language:English
Published: IEEE 2024-01-01
Series:IEEE Journal of the Electron Devices Society
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Online Access:https://ieeexplore.ieee.org/document/10414786/
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author Samuel Parent
Frederic Vachon
Valerie Gauthier
Steve Lamoureux
Alexandre Paquette
Jacob Deschamps
Tommy Rossignol
Nicolas Roy
Philippe Arsenault
Henri Dautet
Serge A. Charlebois
Jean-Francois Pratte
author_facet Samuel Parent
Frederic Vachon
Valerie Gauthier
Steve Lamoureux
Alexandre Paquette
Jacob Deschamps
Tommy Rossignol
Nicolas Roy
Philippe Arsenault
Henri Dautet
Serge A. Charlebois
Jean-Francois Pratte
author_sort Samuel Parent
collection DOAJ
description When developing a technology based on single-photon avalanche diodes (SPADs), the SPAD characterization is mandatory to debug, optimize and monitor the microfabrication process. This is especially true for the development of SPAD arrays 3D integrated with CMOS readout electronics, where SPAD testing is required to qualify the process, independently from the final CMOS readout circuit. This work reports on a characterization and monitoring platform dedicated to SPAD testing at die and wafer level, in the context of a 3D SPAD technology development. The platform relies on a dedicated integrated circuit made in a standard CMOS technology and used in different configurations from a prototype printed circuit board (die-level testing) to active probe cards (wafer-level mapping). The platform gives full access to SPAD characteristics in Geiger mode such as the dark noise, photon detection efficiency and timing resolution. The integrated circuit and its configuration are described in detail as well as results obtained on different SPAD test structures. In particular, the dark count rate mapping demonstrates the benefits of testing SPADs at wafer level at the R&D stage.
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institution Kabale University
issn 2168-6734
language English
publishDate 2024-01-01
publisher IEEE
record_format Article
series IEEE Journal of the Electron Devices Society
spelling doaj-art-227b16494c96405e875220c6e2c1c4e02025-01-28T00:00:30ZengIEEEIEEE Journal of the Electron Devices Society2168-67342024-01-011212713710.1109/JEDS.2024.335908810414786Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche DiodesSamuel Parent0https://orcid.org/0000-0003-4992-9489Frederic Vachon1https://orcid.org/0000-0002-6976-6624Valerie Gauthier2Steve Lamoureux3https://orcid.org/0000-0003-2146-777XAlexandre Paquette4Jacob Deschamps5Tommy Rossignol6https://orcid.org/0000-0002-9270-9193Nicolas Roy7https://orcid.org/0000-0002-4718-210XPhilippe Arsenault8https://orcid.org/0009-0003-0772-1177Henri Dautet9Serge A. Charlebois10https://orcid.org/0000-0001-7857-5056Jean-Francois Pratte11https://orcid.org/0000-0002-8327-3842Department of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaDepartment of Electrical and Computer Engineering, Institut Interdisciplinaire d’Innovation Technologique, Sherbrooke, QC, CanadaWhen developing a technology based on single-photon avalanche diodes (SPADs), the SPAD characterization is mandatory to debug, optimize and monitor the microfabrication process. This is especially true for the development of SPAD arrays 3D integrated with CMOS readout electronics, where SPAD testing is required to qualify the process, independently from the final CMOS readout circuit. This work reports on a characterization and monitoring platform dedicated to SPAD testing at die and wafer level, in the context of a 3D SPAD technology development. The platform relies on a dedicated integrated circuit made in a standard CMOS technology and used in different configurations from a prototype printed circuit board (die-level testing) to active probe cards (wafer-level mapping). The platform gives full access to SPAD characteristics in Geiger mode such as the dark noise, photon detection efficiency and timing resolution. The integrated circuit and its configuration are described in detail as well as results obtained on different SPAD test structures. In particular, the dark count rate mapping demonstrates the benefits of testing SPADs at wafer level at the R&D stage.https://ieeexplore.ieee.org/document/10414786/Active probe cardphoton-to-digital converterprocess control monitoringsilicon photomultipliersingle-photon avalanche diodewafer-level testing
spellingShingle Samuel Parent
Frederic Vachon
Valerie Gauthier
Steve Lamoureux
Alexandre Paquette
Jacob Deschamps
Tommy Rossignol
Nicolas Roy
Philippe Arsenault
Henri Dautet
Serge A. Charlebois
Jean-Francois Pratte
Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
IEEE Journal of the Electron Devices Society
Active probe card
photon-to-digital converter
process control monitoring
silicon photomultiplier
single-photon avalanche diode
wafer-level testing
title Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
title_full Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
title_fullStr Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
title_full_unstemmed Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
title_short Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes
title_sort wafer level characterization and monitoring platform for single photon avalanche diodes
topic Active probe card
photon-to-digital converter
process control monitoring
silicon photomultiplier
single-photon avalanche diode
wafer-level testing
url https://ieeexplore.ieee.org/document/10414786/
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