Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered array...

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Main Authors: Colm T. O’Mahony, Dipu Borah, Michael A. Morris
Format: Article
Language:English
Published: Wiley 2015-01-01
Series:International Journal of Polymer Science
Online Access:http://dx.doi.org/10.1155/2015/270891
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author Colm T. O’Mahony
Dipu Borah
Michael A. Morris
author_facet Colm T. O’Mahony
Dipu Borah
Michael A. Morris
author_sort Colm T. O’Mahony
collection DOAJ
description Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.
format Article
id doaj-art-1c956f9d1fe744e2a00c221386b4e1d1
institution Kabale University
issn 1687-9422
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language English
publishDate 2015-01-01
publisher Wiley
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series International Journal of Polymer Science
spelling doaj-art-1c956f9d1fe744e2a00c221386b4e1d12025-02-03T06:13:12ZengWileyInternational Journal of Polymer Science1687-94221687-94302015-01-01201510.1155/2015/270891270891Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on MorphologyColm T. O’Mahony0Dipu Borah1Michael A. Morris2Materials Chemistry Section, Department of Chemistry, University College Cork, Cork, IrelandMaterials Chemistry Section, Department of Chemistry, University College Cork, Cork, IrelandMaterials Chemistry Section, Department of Chemistry, University College Cork, Cork, IrelandBlock copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.http://dx.doi.org/10.1155/2015/270891
spellingShingle Colm T. O’Mahony
Dipu Borah
Michael A. Morris
Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
International Journal of Polymer Science
title Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
title_full Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
title_fullStr Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
title_full_unstemmed Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
title_short Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
title_sort microphase separation of a ps b pfs block copolymer via solvent annealing effect of solvent substrate and exposure time on morphology
url http://dx.doi.org/10.1155/2015/270891
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