Double Gold/Nitrogen Nanosecond-Laser-Doping of Gold-Coated Silicon Wafer Surfaces in Liquid Nitrogen

Double Gold/Nitrogen Nanosecond-Laser-Doping of Gold-Coated Silicon Wafer Surfaces in Liquid Nitrogen

A novel double-impurity doping process for silicon (Si) surfaces was developed, utilizing nanosecond-laser melting of an 11 nm thick gold (Au) top film and a Si wafer substrate in a laser plasma-activated liquid nitrogen (LN) environment. Scanning electron microscopy revealed a fluence- and exposure...

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Bibliographic Details
Main Authors: Sergey Kudryashov, Alena Nastulyavichus, Victoria Pryakhina, Evgenia Ulturgasheva, Michael Kovalev, Ivan Podlesnykh, Nikita Stsepuro, Vadim Shakhnov
Format: Article
Language:English
Published: MDPI AG 2024-11-01
Series:Technologies
Subjects:
nanosecond-laser
Si wafer
top Au film
liquid nitrogen environment
Au/N double-element doping
nano-recrystallization of Si
Online Access:https://www.mdpi.com/2227-7080/12/11/224
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