Surface quality prediction and validation of Electro-Fenton chemical mechanical polishing for single crystal SiC based on neural network models
To enhance the Electro-Fenton Chemical Mechanical Polishing (EF-CMP) process for single-crystal SiC, this study employs factorial analysis to investigate the influence of process parameters on material removal rate (MRR) and surface roughness Ra. Predictive models are developed using Radial Basis Fu...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-09-01
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| Series: | Results in Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590123025027549 |
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