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    Analytical model and simulation‐based analysis of a work function engineered triple metal tunnel field‐effect transistor device showing excellent device performance by Ria Bose, Jatindra Nath Roy

    Published 2021-01-01
    “…A simulation‐based study of these TFET devices has been carried out with the help of 2D TCAD (Technology Computer Aided Design) Sentaurus device simulator for different channel length values in order to validate our proposed mathematical model. The source side n + pocket in the proposed triple metal (TM) TFET device enhances tunnelling probability thus increasing on current and off current is controlled by another n‐pocket near drain side. …”
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