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    Progress in the Sputtering Preparation of Hf0.5Zr0.5O2 Ferroelectric Films and Memories by Kun Chen, Dan Zheng, Jie Gao, Hao Wang, Baoyuan Wang

    Published 2025-02-01
    “…Meanwhile, due to the many advantages of sputtering, such as higher throughputs, low cost and no carbon contamination, this review mainly focused on the preparation of Hf0.5Zr0.5O2 ferroelectric thin films by sputtering and explored its working mechanism and optimization strategy. …”
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