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1921
Nanoclustering in Silicon Induced by Oxygen Ions Implanted
Published 2011-11-01“…A tandem‐type accelerator, with a maximum acceleration voltage of 3 MV, equipped with a sputtering ion source suitable for the production of high current ion beams by sputtering of solid cathodes has been used. …”
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1922
XPS Studies of LSCF Interfaces after Cell Testing
Published 2018-01-01“…In this work, an SOFC button cell is first tested, and then, the LSCF cathode, barrier layer, and electrolyte are sputtered away to study the behavior of different interfaces. …”
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1923
Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC
Published 2011-01-01“…The collision model are based of Monte Carlo simulations is discussed for DC sputtering in lower pressure regimes. In order to simulate transport phenomena within sputtering processes realistically, a spatial and temporal knowledge of the plasma density and electrostatic field configuration is needed. …”
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1924
Pixel Imaging Method, Transport Phenomenon in Sizes From Nano, Micro, and Milli Scale Pore Membrane
Published 2025-01-01“…We study the ion transport for silicon nitride sputtered with silicon dioxide (Si3N4–SiO2) nanopore membrane, graphene, and molybdenum disulfide (MoS2) nanopore membrane. …”
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1925
Hybrid Carbon Fibers/Carbon Nanotubes Structures for Next Generation Polymeric Composites
Published 2010-01-01“…Electrochemical deposition of iron using pulse voltametry is compared to DC magnetron iron sputtering. Carbon nanostructures growth was performed using a thermal CVD system. …”
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1926
Fabrication of Dye-Sensitized Solar Cells with a 3D Nanostructured Electrode
Published 2010-01-01“…The distinctive characteristic of this novel scheme is that the conventional thin film electrode is replaced by a 3D nanostructured indium tin oxide (ITO) electrode, which was fabricated using RF magnetron sputtering with an anodic aluminum oxide (AAO) template. …”
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1927
MOCVD ZnO/Screen Printed Ag Back Reflector for Flexible Thin Film Silicon Solar Cell Application
Published 2014-01-01“…A discontinuity and poor contact interface between the MOCVD ZnO and screen printed Ag layers caused poor open circuit voltage (Voc) and low fill factor (FF); however, an insertion of a thin sputtered ZnO layer at the interface could solve this problem. …”
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1928
Effect of Different Deposition Power of In2O3 Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method
Published 2014-01-01“…The (In, Ga, Zn)Ox (IGZO) thin films were deposited on glass substrates using cosputtering method in radio frequency magnetron sputtering system. Zn2Ga2O5 (Ga2O3-2 ZnO, GZO) and In2O3 ceramics were used as targets and dual guns were used to deposit the IGZO thin films. …”
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1929
Microstructural Characters of Lyctinae and Dinoderinae (Coleoptera: Bostrichidae)
Published 2010-01-01“…Thirty-three species belonging to the bostrichid subfamilies Lyctinae and Dinoderinae were examined by low vacuum ESEM without sputtering. Eight types of microsculpture, five types of hair insertion, and 14 types of hair were found on the elytral disc and declivity. …”
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1930
XPS and GDOES Characterization of Porous Coating Enriched with Copper and Calcium Obtained on Tantalum via Plasma Electrolytic Oxidation
Published 2016-01-01“…The authors also propose a new model of PEO, based on the derivative of GDOES signals with sputtering time.…”
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1931
Ultra-low reverse leakage NiOx/β-Ga2O3 heterojunction diode achieving breakdown voltage >3 kV with plasma etch field-termination
Published 2025-01-01“…The heterojunction diodes are fabricated via bilayer NiOx sputtering followed by self-aligned plasma-etching for field-termination on both large (1-mm2) and small area (300/100-μm diameter) devices. …”
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1932
Amorphization and siliconization of silicon carbide as a first wall material
Published 2025-01-01“…The surface model is a homogeneous mixed-material model that tracks physical & chemical sputtering and reflection of impurities. Gross erosion is primarily influenced by the background plasma parameters and redeposition patterns are mainly influenced by the prompt redeposition due to the gyro-orbits of impurity ions. …”
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1933
Thermal Oxidation Preparation of Doped Hematite Thin Films for Photoelectrochemical Water Splitting
Published 2014-01-01“…The alloyed films were deposited on FTO glass by magnetron sputtering and their compositions were controlled by the target. …”
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1934
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1935
Potential of Zinc Oxide Nanostructures in Biosensor Application
Published 2025-01-01“…Various synthesis techniques, that include sol-gel, sputtering, and chemical vapor deposition, were successfully employed to prepare different ZnO nanostructures, like nanorods, nanotubes, and nanowires. …”
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1936
Visible-mid infrared ultra-broadband and wide-angle metamaterial perfect absorber based on cermet films with nano-cone structure
Published 2023-03-01“…The composite process of two easy-operated and efficient methods, colloidal lithography, and magnetron sputtering, is employed for large-area fabrication. …”
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1937
Flexible Surface Acoustic Wave Device with AlN Film on Polymer Substrate
Published 2012-01-01“…In this work, the AlN films have been successfully deposited on polymer substrates using the DC reactive magnetron-sputtering method at room temperature, and the XRD, SEM, and AFM methods reveal that low deposition pressure is beneficial to the highly c-axis-oriented AlN film on polymer substrates. …”
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1938
Photocatalytic Activity of Nanostructured Titanium Dioxide Thin Films
Published 2012-01-01“…The glancing angle deposition method with DC sputtering at low temperature was applied for deposition of the layers with various columnar structures. …”
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1939
The Influence of Surface Morphology of Buffer Layer on the Critical Current Density in YBCO Coated Conductors
Published 2013-01-01“…1 μm-thick YBa2Cu3O7-δ (YBCO) films were grown on the Y2O3/yttria stabilized zirconia (YSZ)/CeO2 buffer layers with different surface morphologies using direct-current sputtering. The critical current density (Jc) value of YBCO was 1.1 MA/cm2 when the root mean square surface roughness (Rrms) of the buffer layer was 2.5 nm. …”
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1940
Application of Different Extraction Methods for Investigation of Nonmetallic Inclusions and Clusters in Steels and Alloys
Published 2014-01-01“…In this study, the application of various extraction methods (chemical extraction/etching by acid or halogen-alcohol solutions, electrolysis, sputtering with glow discharge, and so on) for 3D estimation of nonmetallic Al2O3 inclusions and clusters in high-alloyed steels was examined and discussed using an Fe-10 mass% Ni alloy and an 18/8 stainless steel deoxidized with Al. …”
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