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    Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering by Shao-Ze Tseng, Chang-Rong Lin, Hung-Sen Wei, Chia-Hua Chan, Sheng-Hui Chen

    Published 2014-01-01
    “…This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si : H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. …”
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    Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO2 Coatings by N. Madaoui, L. Bait, K. Kheyar, N. Saoula

    Published 2017-01-01
    “…A reactive r.f magnetron sputtering method was used to deposit titanium dioxide coating on stainless steel substrates without intentional heating or biasing. …”
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    Introduction to Chemical Principles / by Peters, Edward I.

    Published 1974
    View in OPAC
    Book
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    Graham Greene : a life in letters / by Greene, Graham, 1904-1991

    Published 2004
    View in OPAC
    Book
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    ZnO:Al Grown by Sputtering from Two Different Target Sources: A Comparison Study by Abdalla A. Alnajjar

    Published 2012-01-01
    “…Ceramic targets were used in RF magnetron sputtering, whereas pulsed magnetron sputtering was used to grow films from powder targets. …”
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    Article
  13. 73

    Fabrication of SiC@Cu/Cu Composites with the Addition of SiC@Cu Powder by Magnetron Sputtering by Zhang Yunlong, Li Wenbo, Hu Ming, Yi Hongyong, Zhou Wei, Ding Peiling, Tang Lili

    Published 2021-01-01
    “…The SiC@Cu powders were treated by magnetron sputtering technology. Then, dynamic deposit behavior was described according to SEM results. …”
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    Article
  14. 74

    Photocatalytic Properties of Columnar Nanostructured TiO2 Films Fabricated by Sputtering Ti and Subsequent Annealing by Zhengcao Li, Liping Xing, Zhengjun Zhang

    Published 2012-01-01
    “…Compared with sputtering TiO2 target directly, sputtering Ti target can be carried out under much lower base pressure, which contributes to obtaining discrete columnar nanostructures. …”
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    Understanding the Preferred Crystal Orientation of Sputtered Silver in Ar/N2 Atmosphere: A Microstructure Investigation by YuHao Hu, Jiajun Zhu, Chao Zhang, Wulin Yang, Licai Fu, Deyi Li, Lingping Zhou

    Published 2019-01-01
    “…Silver thin films were prepared by direct current (DC) magnetron sputtering technique in Ar/N2 atmosphere with various N2 volumetric ratios on Si substrates. …”
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  16. 76

    Freeze-Thaw Cycle Effect on Sputtering Rate of Water-Saturated Yellow Sandstone under Impact Loading by Yunbing Hu, Tianzhu Duan, Penghui Xian, Liang Chen

    Published 2019-01-01
    “…In order to explore the impact of freeze-thaw temperature on the sputtering rate of water-saturated yellow sandstone under impact loading, in this paper, the Hopkinson pressure bar is used to conduct impact loading test on the water-saturated yellow sandstone at the same strain rate (74.22 s−1) under five different freeze-thaw temperatures. …”
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  17. 77

    Effect of Oxygen Flow Rate on the Optical, Electrical, and Mechanical Properties of DC Sputtering ITO Thin Films by Chuen-Lin Tien, Hong-Yi Lin, Chih-Kai Chang, Chien-Jen Tang

    Published 2018-01-01
    “…This study presents the effect of oxygen flow rate on the optical, electrical, and mechanical properties of indium tin oxide (ITO) thin films prepared by the DC magnetron sputtering technique. The oxygen flow rate was varied from 10 to 50 sccm. …”
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