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  1. 1
    A Rational Design Method for the Nagoya Type-III Antenna

    A Rational Design Method for the Nagoya Type-III Antenna by Daniele Iannarelli, Francesco Napoli, Antonella Ingenito, Alessandro Cardinali, Antonella De Ninno, Simone Mannori

    Published 2024-12-01
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  2. 2
    Development of deep silicon plasma etching for 3D integration technology

    Development of deep silicon plasma etching for 3D integration technology by А. А. Golishnikov, M. G. Putrya

    Published 2014-02-01
    Subjects: “…transformer coupled plasma source…”
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  3. 3
    Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation

    Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation by Leopoldo Soto, Cristian Pavez, José Pedreros, Jalaj Jain, José Moreno, Patricio San Martín, Fermín Castillo, Daniel Zanelli, Luis Altamirano

    Published 2024-09-01
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  4. 4
    Etching Chemistry Process Optimization of Ethylene Diluted with Helium (C<sub>2</sub>H<sub>4</sub>/He) in Interconnect Integration

    Etching Chemistry Process Optimization of Ethylene Diluted with Helium (C<sub>2</sub>H<sub>4</sub>/He) in Interconnect Integration by Hwa-Rim Lee, Eun-Su Jung, Jin-Uk Yoo, Tae-Min Choi, Sung-Gyu Pyo

    Published 2024-11-01
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  5. 5
    SIMULATION OF A HIGH-CURRENT NON-SELF-SUSTAINED GLOW DISCHARGE WITH A HOLLOW CATHODE AT LOW PRESSURE

    SIMULATION OF A HIGH-CURRENT NON-SELF-SUSTAINED GLOW DISCHARGE WITH A HOLLOW CATHODE AT LOW PRESSURE by Tamara V. Koval, Vladimir V. Denisov, Eugene V. Ostroverkhov

    Published 2023-06-01
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  6. 6
    Predicting Performance of Hall Effect Ion Source Using Machine Learning

    Predicting Performance of Hall Effect Ion Source Using Machine Learning by Jaehong Park, Guentae Doh, Dongho Lee, Youngho Kim, Changmin Shin, Su‐Jin Shin, Young‐Chul Ghim, Sanghoo Park, Wonho Choe

    Published 2025-03-01
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