Showing 21 - 40 results of 43 for search '"lithography"', query time: 0.05s Refine Results
  1. 21

    Tuning Metamaterials for Applications at DUV Wavelengths by Andrew Estroff, Bruce W. Smith

    Published 2012-01-01
    “…A method for performing plasmonic interference lithography with this metamaterial has been proposed, with calculations showing the potential for half-pitch imaging resolution of 25 nm.…”
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    Article
  2. 22

    Enhanced Light Trapping in Thin Film Solar Cells Using a Plasmonic Fishnet Structure by Sayan Seal, Vinay Budhraja, Liming Ji, Vasundara V. Varadan

    Published 2015-01-01
    “…A silver fishnet structure was fabricated using electron beam lithography (EBL) and thermal evaporation. The final fabricated structure optically resembles a TFSC. …”
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    Article
  3. 23

    Improving Light Extraction of Organic Light-Emitting Devices by Attaching Nanostructures with Self-Assembled Photonic Crystal Patterns by Kai-Yu Peng, Da-Hua Wei

    Published 2014-01-01
    “…A single-monolayered hexagonal self-assembled photonic crystal (PC) pattern fabricated onto polyethylene terephthalate (PET) films by using simple nanosphere lithography (NSL) method has been demonstrated in this research work. …”
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  4. 24
  5. 25

    Tuning Wetting Properties Through Surface Geometry in the Cassie–Baxter State by Talya Scheff, Florence Acha, Nathalia Diaz Armas, Joey L. Mead, Jinde Zhang

    Published 2025-01-01
    “…We used fluoro-silane-treated silicon micro-post patterns fabricated via lithography as model surfaces. By varying the solid fraction (ϕ<sub>s</sub>), edge-to-edge spacing (L), and the shape and arrangement of the micro-posts, we examined how these geometric factors influence wetting behavior. …”
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    Article
  6. 26

    Coherence vortices by binary pinholes by Gautam Akanksha, Agarwal Amit K., Singh Rakesh Kumar

    Published 2024-10-01
    “…The binary pinhole structures have been realized by lithography, followed by wet etching methods. We control the transmittance from the incoherent source plane using these exotic apertures, which finally results in a coherence vortex spectrum that features multiple and pure orbital angular momentum modes. …”
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    Article
  7. 27

    Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation by Liping Shi, Ji Yan, Shuyao Zhang, Panpan Niu, Jiao Geng, Günter Steinmeyer

    Published 2025-01-01
    “…This offers a convenient scheme for actively controlling laser plasmonic lithography.…”
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    Article
  8. 28

    Spatially controlled multicellular differentiation of stem cells using triple factor-releasing metal–organic framework-coated nanoline arrays by Yeon-Woo Cho, Min-Ji Kang, Joon-Ha Park, Yun-Sik Eom, Tae-Hyung Kim

    Published 2025-02-01
    “…The arrays comprise nanohole and nanoline arrays fabricated through interference lithography and selectively capture of UiO-67 metal–organic frameworks on nanoline arrays with a 99.8% efficiency using an optimised asymmetric spin-coating method. …”
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  9. 29

    Visible-mid infrared ultra-broadband and wide-angle metamaterial perfect absorber based on cermet films with nano-cone structure by Yang Fan, Li Rui-Hao, Tan Shi-Long, Dong Jian-Wen, Jiang Shao-Ji

    Published 2023-03-01
    “…The composite process of two easy-operated and efficient methods, colloidal lithography, and magnetron sputtering, is employed for large-area fabrication. …”
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    Article
  10. 30

    Spin polarised quantum conductance in 1D channels by Henry Montagu, Ian Farrer, David Ritchie, Sanjeev Kumar

    Published 2025-01-01
    “…The 1D devices were fabricated using standard lithography techniques consisting of split gates, and a custom-designed back gate allows for the modulation of carrier density within the 1D channel. …”
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  11. 31

    The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging by D Borah, T Ghoshal, M T Shaw, A Chaudhari, N Petkov, A P Bell, J D Holmes, M A Morris

    Published 2014-09-01
    “…The importance of quantifying these complex morphologies has implications for their use in integrated circuit manufacture, where they are being explored as alternative pattern forming methods to conventional UV lithography.…”
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  12. 32

    Optical Fresnel zone plate flat lenses made entirely of colored photoresist through an i-line stepper by Ryohei Yamada, Hiroyuki Kishida, Tomohiro Takami, Itti Rittaporn, Mizuho Matoba, Haruyuki Sakurai, Kuniaki Konishi

    Published 2025-01-01
    “…However, their fabrication, particularly for visible wavelengths, involves complex and costly processes, such as high-resolution lithography and dry-etching, which has limited their availability. …”
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    Article
  13. 33

    Soil and Groundwater Characteristics of a Legacy Spill Site by A Adoki

    Published 2013-07-01
    “…Underground pollution plumes were also in this general direction with possible local variations as dictated by the variations in subsurface lithography from point to point. The potential sources of contamination were: The primary Source of contamination at the study site were the stock piles of excavated surface material deposited at the site; Past accidental leak of crude oil from the 28” pipeline that passes through the western site boundary of the location. …”
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    Article
  14. 34

    Soil and Groundwater Characteristics of a Legacy Spill Site by A Adoki

    Published 2013-07-01
    “…Underground pollution plumes were also in this general direction with possible local variations as dictated by the variations in subsurface lithography from point to point. The potential sources of contamination were: The primary Source of contamination at the study site were the stock piles of excavated surface material deposited at the site; Past accidental leak of crude oil from the 28” pipeline that passes through the western site boundary of the location. …”
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    Article
  15. 35

    Step-necking growth of silicon nanowire channels for high performance field effect transistors by Lei Wu, Zhiyan Hu, Lei Liang, Ruijin Hu, Junzhuan Wang, Linwei Yu

    Published 2025-01-01
    “…Typically, the patterning of such delicate channels relies on high-precision lithography, which is not applicable for large area electronics. …”
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    Article
  16. 36

    Microfluidic Microreactor Device With Integrated Heaters for Temperature Assisted Synthesis of Gold Nanoparticles and Alkene by Tinku Naik Banavathi, Mukesh Kumar Sivakumar, Aniket Balapure, Sohan Dudala, Satish Kumar Dubey, Sanket Goel

    Published 2024-01-01
    “…The developed heaters were integrated with microfluidic devices fabricated using the soft-lithography technique. The functionality of these devices was demonstrated by performing gold nanoparticles (inorganic) and alkene (organic) synthesis. …”
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  17. 37

    Multilayer all-polymer metasurface stacked on optical fiber via sequential micro-punching process by Kim Moohyuk, Park Nu-Ri, Yu Aran, Kim Jin Tae, Jeon Minseok, Jeon Seung-Woo, Han Sang-Wook, Kim Myung-Ki

    Published 2023-02-01
    “…Mesh-type nanohole metasurfaces are fabricated on a 1.8-μm-thick polymethyl methacrylate (PMMA) layer via e-beam lithography, and the PMMA layer is separated from the substrate and prepared in the form of a membrane using the external frame. …”
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  18. 38

    Laser Writing of GaN/Ga2O3 Heterojunction Photodetector Arrays by Pengxiang Sun, Xun Yang, Kexue Li, Zhipeng Wei, Wei Fan, Shaoyi Wang, Weimin Zhou, Chongxin Shan

    Published 2025-01-01
    “…However, the fabrication of a photodetector is a complex process that involves precise control of surface preparation, lithography, and deposition techniques. Here the study demonstrates that GaN/Ga2O3 heterojunctions can be fabricated utilizing laser processing to transform the surface of GaN into Ga2O3. …”
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  19. 39

    Unraveling the laser decal transfer-based printing of ZnO ceramic towards FEP-ZnO-based Piezo-Tribo hybrid nanogenerators by Arpit Kumar Singh, Anshu Sahu, Palani Iyamperumal Anand

    Published 2025-03-01
    “…Most MEMS devices are fabricated using either lithography-based processes or microfabrication systems, both of which involve phase change during fabrication. …”
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  20. 40

    Fabrication of Axial and Radial Heterostructures for Semiconductor Nanowires by Using Selective-Area Metal-Organic Vapor-Phase Epitaxy by K. Hiruma, K. Tomioka, P. Mohan, L. Yang, J. Noborisaka, B. Hua, A. Hayashida, S. Fujisawa, S. Hara, J. Motohisa, T. Fukui

    Published 2012-01-01
    “…Nanowires, with a diameter of 50–300 nm and with a length of up to 10 μm, have been grown along the 〈111〉B or 〈111〉A crystallographic orientation from lithography-defined SiO2 mask openings on a group III-V semiconductor substrate surface. …”
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