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  1. 7001

    Inverse design of high-NA metalens for maskless lithography by Chung Haejun, Zhang Feng, Li Hao, Miller Owen D., Smith Henry I.

    Published 2023-02-01
    “…We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication.…”
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    APP: An Ultralightweight Scheme to Authenticate ONS and Protect EPC Privacy without Cryptography in EPCglobal Networks by Wei Ren, Liangli Ma, Yi Ren

    Published 2013-06-01
    “…Object Name Service (ONS) in EPCglobal framework raises two critical security risks: the authenticity of IP addresses for Physical Markup Language (PML) servers and the privacy of Electronic Product Codes (EPCs). Existing work considers either the IP address authentication or the EPC privacy. …”
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