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The influence of nitrogen and titanium carbonitride particles on structure and properties of metal Fe-C-Cr-Ni-Mo system deposited by flux wire
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363
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Different temperatures leakage mechanisms of (Al2O3)x(HfO2)1−x gate Dielectrics deposited by atomic layer deposition
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Temperature-Dependent Hydrogen Modulations of Ultra-Scaled a-IGZO Thin Film Transistor Under Gate Bias Stress
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