Showing 201 - 220 results of 614 for search '"Thin film"', query time: 0.09s Refine Results
  1. 201

    Manipulation of MWCNT Concentration in MWCNT/TiO2 Nanocomposite Thin Films for Dye-Sensitized Solar Cell by Huda Abdullah, Mohd Zikri Razali, Sahbudin Shaari, Mohd Raihan Taha

    Published 2014-01-01
    “…Field emission scanning electron microscopy (FESEM) gave the morphological surface structure of the thin films. The thin films formed in good distribution with homogenous design. …”
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    Article
  2. 202

    Structural Evolution of Low-Molecular-Weight Poly(ethylene oxide)-block-polystyrene Diblock Copolymer Thin Film by Hui Wu, Xiaohua Huang

    Published 2013-01-01
    “…The structural evolution of low-molecular-weight poly(ethylene oxide)-block-polystyrene (PEO-b-PS) diblock copolymer thin film with various initial film thicknesses on silicon substrate under thermal annealing was investigated by atomic force microscopy, optical microscopy, and contact angle measurement. …”
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  3. 203
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    Behaviour of Thin Film TiO2 Overlaid λ/2 Microstrip Rejection Filter Due to Ageing of the Overlay by S. B. Rane, Vijaya Puri

    Published 1998-01-01
    “…The long term behaviour of TiO2 thin film overlaid λ/2 L-section rejection filter due to the ageing of the overlay is reported in this paper. …”
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    MOCVD ZnO/Screen Printed Ag Back Reflector for Flexible Thin Film Silicon Solar Cell Application by Amornrat Limmanee, Patipan Krudtad, Sasiwimon Songtrai, Suttinan Jaroensathainchok, Taweewat Krajangsang, Jaran Sritharathikhun, Kobsak Sriprapha

    Published 2014-01-01
    “…We have prepared Ag back electrode by screen printing technique and developed MOCVD ZnO/screen printed Ag back reflector for flexible thin film silicon solar cell application. A discontinuity and poor contact interface between the MOCVD ZnO and screen printed Ag layers caused poor open circuit voltage (Voc) and low fill factor (FF); however, an insertion of a thin sputtered ZnO layer at the interface could solve this problem. …”
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    Optimal Suppression of Photocatalytic Activity of Hybrid TiO2 Particles in Epoxy Thin Film by Using Taguchi Method by Sunderishwary S. Muniandy, Tan Sek Soon, Swee Yong Pung, Sivakumar Ramakrishnan

    Published 2024-10-01
    “…Overall, A333 effectively suppressed photocatalysis and improved yellowing resistance of epoxy thin film. Copyright © 2024 by Authors, Published by BCREC Publishing Group. …”
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    Strain-Dependence of the Structure and Ferroic Properties of Epitaxial NiTiO3 Thin Films Grown on Different Substrates by Tamas Varga, Timothy C. Droubay, Mark E. Bowden, Libor Kovarik, Dehong Hu, Scott A. Chambers

    Published 2015-01-01
    “…Physical property measurements reveal a dependence of the weak ferromagnetism and lattice polarization on strain and highlight our ability to control the ferroic properties in NiTiO3 thin films by the choice of substrate. Our results are also consistent with the theoretical prediction that the ferromagnetism in acentric NiTiO3 is polarization induced. …”
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    Effect of Different Deposition Power of In2O3 Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method by Shang-Chao Hung, Kin-Tak Lam, Cheng-Fu Yang, Yu-Jhen Liou

    Published 2014-01-01
    “…The (In, Ga, Zn)Ox (IGZO) thin films were deposited on glass substrates using cosputtering method in radio frequency magnetron sputtering system. …”
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    Profiling the Properties of SILAR Synthesized MnSe Films as Potential Material for Absorber Layer of Thin Film Solar Cells by Asielue O Kingsley, Opene J Nkechi, Okoli N Livinus

    Published 2025-01-01
    “…This study investigates the optical, structural, and electrical properties of manganese selenide (MnSe) thin films synthesized using the Successive Ionic Layer Adsorption and Reaction (SILAR) method, with varying volumes of triethylamine (TEA) as a complexing agent. …”
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    Effect of the Change of Deposition Time on the Secondary Direction and Abnormal Shape of Grains Growth of SnO2 Thin Films by Jin Jeong

    Published 2015-01-01
    “…SnO2 thin films were grown on Si substrate using the low pressure chemical vapor deposition method. …”
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