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    Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

    Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography by Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu

    Published 2025-04-01
    Subjects: “…Submicron light source…”
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