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    Precursor sticking coefficient determination from indented deposits fabricated by electron beam induced deposition by Alexander Kuprava, Michael Huth

    Published 2025-01-01
    “…We employ the method to determine the precursor sticking coefficient for bis(benzene)chromium, Cr(C6H6)2, and trimethyl(methylcyclopentadienyl)platinum(IV), Me3CpPtMe, and find a value of about 10−2 for both precursors, which is substantially smaller than the sticking coefficients previously assumed for Me3CpPtMe (1.0). …”
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