Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode
Niobium-doped titanium dioxide (TiO2) nanoparticles were used as a photoanode in dye-sensitized solar cells (DSCs). They showed a high photocurrent density due to their higher conductivity; however, a low open-circuit voltage was exhibited due to the back-reaction of photogenerated electrons. Atomic...
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| Format: | Article |
| Language: | English |
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Wiley
2012-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/401393 |
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| author | Naji Al Dahoudi Qifeng Zhang Guozhong Cao |
| author_facet | Naji Al Dahoudi Qifeng Zhang Guozhong Cao |
| author_sort | Naji Al Dahoudi |
| collection | DOAJ |
| description | Niobium-doped titanium dioxide (TiO2) nanoparticles were used as a photoanode in dye-sensitized solar cells (DSCs). They showed a high photocurrent density due to their higher conductivity; however, a low open-circuit voltage was exhibited due to the back-reaction of photogenerated electrons. Atomic layer deposition is a useful technique to form a conformal ultrathin layer of Al2O3 and HfO, which act as an energy barrier to suppress the back electrons from reaching the redox medium. This resulted in an increase of the open-circuit voltage and therefore led to higher performance. HfO showed an improvement of the light-to-current conversion efficiency by 74%, higher than the 21% enhancement obtained by utilizing Al2O3 layers. |
| format | Article |
| id | doaj-art-fc07f5e4ae174915b269fda2bd20dcc4 |
| institution | Kabale University |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2012-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-fc07f5e4ae174915b269fda2bd20dcc42025-02-03T01:25:59ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2012-01-01201210.1155/2012/401393401393Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide PhotoanodeNaji Al Dahoudi0Qifeng Zhang1Guozhong Cao2Department of Materials Science and Engineering, University of Washington, Seattle, WA 98195, USADepartment of Materials Science and Engineering, University of Washington, Seattle, WA 98195, USADepartment of Materials Science and Engineering, University of Washington, Seattle, WA 98195, USANiobium-doped titanium dioxide (TiO2) nanoparticles were used as a photoanode in dye-sensitized solar cells (DSCs). They showed a high photocurrent density due to their higher conductivity; however, a low open-circuit voltage was exhibited due to the back-reaction of photogenerated electrons. Atomic layer deposition is a useful technique to form a conformal ultrathin layer of Al2O3 and HfO, which act as an energy barrier to suppress the back electrons from reaching the redox medium. This resulted in an increase of the open-circuit voltage and therefore led to higher performance. HfO showed an improvement of the light-to-current conversion efficiency by 74%, higher than the 21% enhancement obtained by utilizing Al2O3 layers.http://dx.doi.org/10.1155/2012/401393 |
| spellingShingle | Naji Al Dahoudi Qifeng Zhang Guozhong Cao Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode International Journal of Photoenergy |
| title | Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode |
| title_full | Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode |
| title_fullStr | Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode |
| title_full_unstemmed | Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode |
| title_short | Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode |
| title_sort | alumina and hafnia ald layers for a niobium doped titanium oxide photoanode |
| url | http://dx.doi.org/10.1155/2012/401393 |
| work_keys_str_mv | AT najialdahoudi aluminaandhafniaaldlayersforaniobiumdopedtitaniumoxidephotoanode AT qifengzhang aluminaandhafniaaldlayersforaniobiumdopedtitaniumoxidephotoanode AT guozhongcao aluminaandhafniaaldlayersforaniobiumdopedtitaniumoxidephotoanode |