Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer

Poor charge transport mechanism and light‐induced degradation effects are among the key factors leading to the degraded performance of single‐junction amorphous silicon (a‐Si:H) solar cells. Existent photovoltaic configurations, based on amorphous silicon carbide (a‐SiC:H) window layer, have establi...

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Main Authors: Haris Mehmood, Tauseef Tauqeer
Format: Article
Language:English
Published: Wiley 2017-11-01
Series:IET Circuits, Devices and Systems
Subjects:
Online Access:https://doi.org/10.1049/iet-cds.2017.0072
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author Haris Mehmood
Tauseef Tauqeer
author_facet Haris Mehmood
Tauseef Tauqeer
author_sort Haris Mehmood
collection DOAJ
description Poor charge transport mechanism and light‐induced degradation effects are among the key factors leading to the degraded performance of single‐junction amorphous silicon (a‐Si:H) solar cells. Existent photovoltaic configurations, based on amorphous silicon carbide (a‐SiC:H) window layer, have established efficiencies in the range of 7–10%. Limited performance of such devices has been addressed by replacing a‐SiC:H with a wide band gap (∼2 eV) hydrogenated nano‐crystalline silicon (nc‐Si:H) layer that reportedly exhibits crystalline properties at small scale. Here, the proposed solar cell based on p‐nc‐Si:H/i‐a‐Si:H (buffer)/i‐a‐Si:H/n‐a‐Si:H configuration has been simulated with SILVACO TCAD by analysing window and intrinsic absorber layers thickness, as well as doping concentrations. Along with the engineering of p/i interface, in‐depth evaluation of absorber defects parameters has also been undertaken in order to reduce the recombination rate. The simulated results of an optimised single‐junction device demonstrated an open‐circuit voltage (VOC) of 0.865 V, short‐circuit current density (JSC) of 21.7 mA/cm2, Fill factor (FF) of 0.69 and power conversion efficiency of 12.93%, which is promising when compared with the solar cell already reported. The proposed structure will provide the platform for further development of low cost and efficient multijunction thin‐film amorphous solar cell technology.
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spelling doaj-art-ed3c6ebea50d4f958f6c7ec867b3c7e22025-02-03T01:32:08ZengWileyIET Circuits, Devices and Systems1751-858X1751-85982017-11-0111666667510.1049/iet-cds.2017.0072Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layerHaris Mehmood0Tauseef Tauqeer1National University of Sciences and Technology (NUST)IslamabadPakistanInformation Technology University (ITU)LahorePakistanPoor charge transport mechanism and light‐induced degradation effects are among the key factors leading to the degraded performance of single‐junction amorphous silicon (a‐Si:H) solar cells. Existent photovoltaic configurations, based on amorphous silicon carbide (a‐SiC:H) window layer, have established efficiencies in the range of 7–10%. Limited performance of such devices has been addressed by replacing a‐SiC:H with a wide band gap (∼2 eV) hydrogenated nano‐crystalline silicon (nc‐Si:H) layer that reportedly exhibits crystalline properties at small scale. Here, the proposed solar cell based on p‐nc‐Si:H/i‐a‐Si:H (buffer)/i‐a‐Si:H/n‐a‐Si:H configuration has been simulated with SILVACO TCAD by analysing window and intrinsic absorber layers thickness, as well as doping concentrations. Along with the engineering of p/i interface, in‐depth evaluation of absorber defects parameters has also been undertaken in order to reduce the recombination rate. The simulated results of an optimised single‐junction device demonstrated an open‐circuit voltage (VOC) of 0.865 V, short‐circuit current density (JSC) of 21.7 mA/cm2, Fill factor (FF) of 0.69 and power conversion efficiency of 12.93%, which is promising when compared with the solar cell already reported. The proposed structure will provide the platform for further development of low cost and efficient multijunction thin‐film amorphous solar cell technology.https://doi.org/10.1049/iet-cds.2017.0072charge transport mechanismlight-induced degradation effectsingle-junction thin-film hydrogenated amorphous silicon solar cellphotovoltaic configurationamorphous silicon carbideamorphous silicon solar cell structure
spellingShingle Haris Mehmood
Tauseef Tauqeer
Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
IET Circuits, Devices and Systems
charge transport mechanism
light-induced degradation effect
single-junction thin-film hydrogenated amorphous silicon solar cell
photovoltaic configuration
amorphous silicon carbide
amorphous silicon solar cell structure
title Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
title_full Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
title_fullStr Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
title_full_unstemmed Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
title_short Modelling and performance analysis of amorphous silicon solar cell using wide band gap nc‐Si:H window layer
title_sort modelling and performance analysis of amorphous silicon solar cell using wide band gap nc si h window layer
topic charge transport mechanism
light-induced degradation effect
single-junction thin-film hydrogenated amorphous silicon solar cell
photovoltaic configuration
amorphous silicon carbide
amorphous silicon solar cell structure
url https://doi.org/10.1049/iet-cds.2017.0072
work_keys_str_mv AT harismehmood modellingandperformanceanalysisofamorphoussiliconsolarcellusingwidebandgapncsihwindowlayer
AT tauseeftauqeer modellingandperformanceanalysisofamorphoussiliconsolarcellusingwidebandgapncsihwindowlayer