Cong, J., Mao, L., Xie, S., Zhao, F., Yan, D., & Guo, W. Photoelectric Dual Control Negative Differential Resistance Device Fabricated by Standard CMOS Process. IEEE.
Chicago Style (17th ed.) CitationCong, Jia, Luhong Mao, Sheng Xie, Fan Zhao, Dong Yan, and Weilian Guo. Photoelectric Dual Control Negative Differential Resistance Device Fabricated by Standard CMOS Process. IEEE.
MLA (9th ed.) CitationCong, Jia, et al. Photoelectric Dual Control Negative Differential Resistance Device Fabricated by Standard CMOS Process. IEEE.
Warning: These citations may not always be 100% accurate.