Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics

This paper presents impact of layout sizes of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT heterostructure high-mobility transistors (HEMTs) on SiC substrate on its characteristics that include the threshold voltage, the maximum transconductance, characteristic frequency, and the maximum oscillation fre...

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Main Authors: Liwei Jin, Zhiqun Cheng, Qingna Wang
Format: Article
Language:English
Published: Wiley 2013-01-01
Series:International Journal of Antennas and Propagation
Online Access:http://dx.doi.org/10.1155/2013/738659
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author Liwei Jin
Zhiqun Cheng
Qingna Wang
author_facet Liwei Jin
Zhiqun Cheng
Qingna Wang
author_sort Liwei Jin
collection DOAJ
description This paper presents impact of layout sizes of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT heterostructure high-mobility transistors (HEMTs) on SiC substrate on its characteristics that include the threshold voltage, the maximum transconductance, characteristic frequency, and the maximum oscillation frequency. The changing parameters include the gate finger number, the gate width per finger. The measurement results based on common-source devices demonstrate that the above parameters have different effects on the threshold voltage, maximum transconductance, and frequency characteristics.
format Article
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institution Kabale University
issn 1687-5869
1687-5877
language English
publishDate 2013-01-01
publisher Wiley
record_format Article
series International Journal of Antennas and Propagation
spelling doaj-art-e91fd2f039c04ef2a6beb7d833eb15442025-02-03T01:11:40ZengWileyInternational Journal of Antennas and Propagation1687-58691687-58772013-01-01201310.1155/2013/738659738659Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its CharacteristicsLiwei Jin0Zhiqun Cheng1Qingna Wang2Key Laboratory of RF Circuit and System, Education Ministry, Hangzhou Dianzi University, Hangzhou 310018, ChinaKey Laboratory of RF Circuit and System, Education Ministry, Hangzhou Dianzi University, Hangzhou 310018, ChinaKey Laboratory of RF Circuit and System, Education Ministry, Hangzhou Dianzi University, Hangzhou 310018, ChinaThis paper presents impact of layout sizes of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT heterostructure high-mobility transistors (HEMTs) on SiC substrate on its characteristics that include the threshold voltage, the maximum transconductance, characteristic frequency, and the maximum oscillation frequency. The changing parameters include the gate finger number, the gate width per finger. The measurement results based on common-source devices demonstrate that the above parameters have different effects on the threshold voltage, maximum transconductance, and frequency characteristics.http://dx.doi.org/10.1155/2013/738659
spellingShingle Liwei Jin
Zhiqun Cheng
Qingna Wang
Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
International Journal of Antennas and Propagation
title Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
title_full Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
title_fullStr Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
title_full_unstemmed Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
title_short Impact of the Gate Width of Al0.27Ga0.73N/AlN/Al0.04Ga0.96N/GaN HEMT on Its Characteristics
title_sort impact of the gate width of al0 27ga0 73n aln al0 04ga0 96n gan hemt on its characteristics
url http://dx.doi.org/10.1155/2013/738659
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