APA (7th ed.) Citation

Kil, T., Yeon, J., Park, H., Lee, M., Yun, E., Kim, M., . . . Park, J. Low-Temperature Deuterium Annealing for HfO₂/SiO₂ Gate Dielectric in Silicon MOSFETs. IEEE.

Chicago Style (17th ed.) Citation

Kil, Tae-Hyun, Ju-Won Yeon, Hyo-Jun Park, Moon-Kwon Lee, Eui-Cheol Yun, Min-Woo Kim, Sang-Min Kang, and Jun-Young Park. Low-Temperature Deuterium Annealing for HfO₂/SiO₂ Gate Dielectric in Silicon MOSFETs. IEEE.

MLA (9th ed.) Citation

Kil, Tae-Hyun, et al. Low-Temperature Deuterium Annealing for HfO₂/SiO₂ Gate Dielectric in Silicon MOSFETs. IEEE.