APA (7th ed.) Citation

Yum, J. H., Oh, J., Hudnall, T. W., Bielawski, C. W., Bersuker, G., & Banerjee, S. K. Comparative Study of SiO2, Al2O3, and BeO Ultrathin Interfacial Barrier Layers in Si Metal-Oxide-Semiconductor Devices. Wiley.

Chicago Style (17th ed.) Citation

Yum, J. H., J. Oh, Todd. W. Hudnall, C. W. Bielawski, G. Bersuker, and S. K. Banerjee. Comparative Study of SiO2, Al2O3, and BeO Ultrathin Interfacial Barrier Layers in Si Metal-Oxide-Semiconductor Devices. Wiley.

MLA (9th ed.) Citation

Yum, J. H., et al. Comparative Study of SiO2, Al2O3, and BeO Ultrathin Interfacial Barrier Layers in Si Metal-Oxide-Semiconductor Devices. Wiley.