An Improved YOLOv7-Tiny-Based Algorithm for Wafer Surface Defect Detection
Wafer surface defect detection is a critical component in the chip manufacturing process. To address the shortcomings of manual inspection and the limitations of existing machine learning methods, this paper proposes a wafer defect detection algorithm based on an improved YOLOv7-tiny. First, a coord...
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| Main Authors: | Mengyun Li, Xueying Wang, Hongtao Zhang, Xiaofeng Hu |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
|
| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10836686/ |
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