Application of Ozone Related Processes to Mineralize Tetramethyl Ammonium Hydroxide in Aqueous Solution
Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO2/Fe3O...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2013-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2013/191742 |
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| Summary: | Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe3O4/O3 > O3 > UV/H2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse. |
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| ISSN: | 1110-662X 1687-529X |