Study of the stress relaxation resistance and microstructural evolution of a Cu–Ni–Si alloy strip
The stress relaxation resistance of a Cu–Ni–Si alloy strip after 48 h of initial loading stress of 80% σ0.2 at 125 °C was studied. The stress relaxation curve was fitted using a model. By employing EBSD, TEM, and other techniques, this study examined the microstructural characteristics of the Cu–Ni–...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-11-01
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| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785424022774 |
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