Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells

The GZO thin films were deposited on the polyimide (PI) substrates to investigate their properties for the possibly flexible applications. The effects of substrate temperature (from room temperature to 200°C) on the surface and cross-session morphologies, X-ray diffraction pattern, optical transmiss...

Full description

Saved in:
Bibliographic Details
Main Authors: Fang-Hsing Wang, Cheng-Fu Yang, Min-Chu Liu
Format: Article
Language:English
Published: Wiley 2013-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2013/263213
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1832566714851655680
author Fang-Hsing Wang
Cheng-Fu Yang
Min-Chu Liu
author_facet Fang-Hsing Wang
Cheng-Fu Yang
Min-Chu Liu
author_sort Fang-Hsing Wang
collection DOAJ
description The GZO thin films were deposited on the polyimide (PI) substrates to investigate their properties for the possibly flexible applications. The effects of substrate temperature (from room temperature to 200°C) on the surface and cross-session morphologies, X-ray diffraction pattern, optical transmission spectrum, carrier concentration, carrier mobility, and resistivity of the GZO thin films on PI substrates were studied. The measured results showed that the substrate temperature had large effect on the characteristics of the GZO thin films. The cross-section observations really indicated that the GZO thin films deposited at 200°C and below had different crystalline structures. The value variations in the films’ optical band gap (Eg) of the GZO thin films were evaluated from plots of  (αhν)2=c(hν-Eg), revealing that the measured Eg values increased with increasing deposition temperature. Finally, the prepared GZO thin films were also used as the transparent electrodes to fabricate the α-Si amorphous silicon thin-film solar cells on the flexible PI substrates, and the properties of which were also measured. We would also prove that substrate temperature of the GZO thin films had large effect on the characteristics of the fabricated α-Si amorphous silicon thin-film solar cells.
format Article
id doaj-art-da11a7c5105447f6b5aff80b44c5c23e
institution Kabale University
issn 1110-662X
1687-529X
language English
publishDate 2013-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-da11a7c5105447f6b5aff80b44c5c23e2025-02-03T01:03:29ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2013-01-01201310.1155/2013/263213263213Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar CellsFang-Hsing Wang0Cheng-Fu Yang1Min-Chu Liu2Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, TaiwanDepartment of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 81148, TaiwanDepartment of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, TaiwanThe GZO thin films were deposited on the polyimide (PI) substrates to investigate their properties for the possibly flexible applications. The effects of substrate temperature (from room temperature to 200°C) on the surface and cross-session morphologies, X-ray diffraction pattern, optical transmission spectrum, carrier concentration, carrier mobility, and resistivity of the GZO thin films on PI substrates were studied. The measured results showed that the substrate temperature had large effect on the characteristics of the GZO thin films. The cross-section observations really indicated that the GZO thin films deposited at 200°C and below had different crystalline structures. The value variations in the films’ optical band gap (Eg) of the GZO thin films were evaluated from plots of  (αhν)2=c(hν-Eg), revealing that the measured Eg values increased with increasing deposition temperature. Finally, the prepared GZO thin films were also used as the transparent electrodes to fabricate the α-Si amorphous silicon thin-film solar cells on the flexible PI substrates, and the properties of which were also measured. We would also prove that substrate temperature of the GZO thin films had large effect on the characteristics of the fabricated α-Si amorphous silicon thin-film solar cells.http://dx.doi.org/10.1155/2013/263213
spellingShingle Fang-Hsing Wang
Cheng-Fu Yang
Min-Chu Liu
Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
International Journal of Photoenergy
title Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
title_full Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
title_fullStr Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
title_full_unstemmed Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
title_short Using Flexible Polyimide as a Substrate to Deposit ZnO:Ga Thin Films and Fabricate p-i-n α-Si:H Thin-Film Solar Cells
title_sort using flexible polyimide as a substrate to deposit zno ga thin films and fabricate p i n α si h thin film solar cells
url http://dx.doi.org/10.1155/2013/263213
work_keys_str_mv AT fanghsingwang usingflexiblepolyimideasasubstratetodepositznogathinfilmsandfabricatepinasihthinfilmsolarcells
AT chengfuyang usingflexiblepolyimideasasubstratetodepositznogathinfilmsandfabricatepinasihthinfilmsolarcells
AT minchuliu usingflexiblepolyimideasasubstratetodepositznogathinfilmsandfabricatepinasihthinfilmsolarcells