Influence of annealing temperature on the photocatalytic efficiency of sol-gel dip-coated ZnO thin films in methyl orange degradation
ZnO thin films on glass substrates and silicon wafers were prepared by the sol-gel dipcoating technique and annealed at temperatures ranging from 300 - 550 °C. X-ray diffraction (XRD) and Raman analysis confirm the hexagonal wurtzite structure of ZnO. Scanning electron microscopy (SEM) examination c...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-03-01
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| Series: | Open Ceramics |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666539524001913 |
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| Summary: | ZnO thin films on glass substrates and silicon wafers were prepared by the sol-gel dipcoating technique and annealed at temperatures ranging from 300 - 550 °C. X-ray diffraction (XRD) and Raman analysis confirm the hexagonal wurtzite structure of ZnO. Scanning electron microscopy (SEM) examination confirmed that the films were homogeneous, crack-free and with a uniform distribution of nano-sized spherical grains. The decomposition of methyl orange (MO) using a solar simulator was used to determine the photocatalytic activity of the thin films. The annealing temperature was found to have a significant influence on the structure, morphology, and photocatalytic performance of ZnO thin films. The best photocatalytic activity under solar irradiation was shown by the ZnO thin film annealed at 450 °C. The enhanced photocatalytic performance of the films can be attributed to their optimized crystallinity, surface roughness and morphology, which provide more active sites for the photocatalytic reactions. |
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| ISSN: | 2666-5395 |